Dark Light
-28%

Matrix System One Stripper Style 10X Plasma Asher Plasma Clean AWD-1-10

Compare

$32,900.00 $45,500.00

Contact Us

HOT SALE !!! Matrix System One Stripper Style 10X Plasma Asher Plasma Clean AWD-1-10, with 1 year warranty. The Matrix System One Stripper Style 10X (Model AWD-1-10) is an industry-standard, single-wafer downstream RF plasma asher and photoresist removal system originally manufactured by Matrix Integrated Systems, Inc.. It is designed primarily for low-damage photoresist stripping, descumming, and surface plasma cleaning during semiconductor fabrication.

Matrix System One Stripper Style 10X Plasma Asher Plasma Clean AWD-1-10 Equipment Summary
  • Manufacturer: Matrix Integrated Systems, Inc.
  • Platform Family: System One Stripper (Style 10X Series, including variations like 102, 103, 105)
  • Specific Sub-Model/Part Code: AWD-1-10
  • Primary Application: Single-wafer photoresist stripping, polymer residue removal, plasma descum, and surface texturing/cleaning. 

Technical Specifications

Feature Specification
Wafer Capability Configurable for 2-inch to 6-inch (50mm – 150mm) round or square substrates.
Plasma Architecture Downstream Plasma (separates plasma generation from the wafer chuck to protect sensitive gate oxides and minimize direct ion bombardment/electrical damage).
RF Generator Source 13.56 MHz RF power supply, typically water-cooled.
RF Process Power Typically 250W – 600W operating range depending on recipe steps.
Process Gases Multi-line Mass Flow Controller (MFC) manifold configured for Oxygen (Oâ‚‚) and Nitrogen (Nâ‚‚) gases.
Thermal Controls Element heated platen/chuck with precise closed-loop temperature control ranging from 60°C to 250°C.
Wafer Handling Automated, robotic cassette-to-cassette wafer processing system with pneumatic pin lift assembly.
Operating Pressure Vacuum-sealed process chamber operating in the range of 1.0 to 6.5 Torr during active bulk strip phases.


Key Applications & Performance Metrics
  • Bulk Resist Stripping: Achieves removal rates between 0.5 to 1.5 μ m/min when utilizing heated bulk processes (200°C – 250°C).
  • High-Efficiency Descum: Removes post-develop residual photoresist at lower temperatures (100°C) at a rate of approximately 600 Ã…/min.
  • Device Preservation: Tailored for GaAs, InP, MEMS, and advanced compound semiconductor architectures where strict control over threshold/capacitance voltage shift is required

Based on 0 reviews

0.0 overall
0
0
0
0
0

Be the first to review “Matrix System One Stripper Style 10X Plasma Asher Plasma Clean AWD-1-10”

There are no reviews yet.

SHOPPING CART

close

Select at least 2 products
to compare