Dark Light
CVC Products Inc AST-601 Vacuum Sputter Deposition System Parts only
CVC Products Inc AST-601 Vacuum Sputter Deposition System Parts only - Image 2
CVC Products Inc AST-601 Vacuum Sputter Deposition System Parts only - Image 3
CVC Products Inc AST-601 Vacuum Sputter Deposition System Parts only - Image 4

CVC Products Inc AST-601 Vacuum Sputter Deposition System Parts only

Condition : Used

Add to wishlist
Compare

$8,200.00

Contact Us
Add to wishlist
Compare

For sale CVC Products Inc AST-601 Vacuum Sputter Deposition System Parts only $ 8.200. This listing is for a CVC Products Inc AST-601 Vacuum Sputter Deposition System, which includes various parts no pumps. The system is designed for PVD technology and was manufactured in the United States. Consolidated Vacuum Components OEM. The equipment type is a Sputtering System and it is suitable for wafer processing equipment, semiconductor & PCB manufacturing equipment, CNC, metalworking & manufacturing, and business & industrial applications.

CVC Products Inc AST-601 Vacuum Sputter Deposition System Components & Subsystems
     When buying or selling an AST-601 system for parts, the package generally consists of the following core assemblies:
  • Process Chamber Hardware: The main vacuum chamber body, rotating substrate platform assembly, and 8-inch target cathode backing plates.
  • Power Supplies & RF Units:
    • ENI ACG-10 RF Plasma Generator
    • Arga Plus CVC KR1 Power Supply
    • Autotube Power KR-11 controller 
  • Measurement & Control Gauges:
    • CVC GIC-410 Ionization Gauge Controller
    • CVC GP-310 Pirani Gauge Controller 
  • Gas Distribution: Mass Flow Controllers (MFCs) calibrated for Argon, Nitrogen, and Oxygen processing gases. 

Technical Platform Specifications
The underlying platform capabilities of a standard CVC AST-601 system include:

Parameter Specification
Technology Type Physical Vapor Deposition (PVD) / Magnetron Sputtering
Deposition Modes RF/DC Magnetron, Diode, Triode, Co-Sputtering, and Bias Sputtering
Substrate Capacity Up to (10) 3-inch wafers or (8) 6-inch wafers per batch
Target Sizes Typically accommodates 8-inch sputtering targets
Ultimate Vacuum Capability Down to 8 × 10⁻⁸ Torr (when fully equipped with a functional cryopump)
Film Uniformity Approximately ± 10% across simultaneous wafer runs
Pre-Clean Options Substrate ion beam cleaning / RF back-sputtering

Common Sputtering Materials Supported
     The hardware in this system is compatible with a wide array of deposition targets, making the salvaged target assemblies and backing plates highly sought after: 
  • Standard Metals: Aluminum (Al), Copper (Cu), Titanium-Tungsten (TiW), Chromium (Cr), Nickel (Ni).
  • Precious Metals: Gold (Au).
  • Magnetic Materials: Cobalt (Co), Iron (Fe), and mixed alloy compositions.
SKU: OME0193 Category: Tags: , ,

Based on 0 reviews

0.0 overall
0
0
0
0
0

Be the first to review “CVC Products Inc AST-601 Vacuum Sputter Deposition System Parts only”

There are no reviews yet.

Related products

SHOPPING CART

close

Select at least 2 products
to compare